Combi IBD System

Details

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• Combinatorial system can be deposited binary or ternary composition with changing 0 to
  100% in the thin film sample. It is possible to make combinatorial film by using the moving mask shutter and fixed mask shutter module.

  Specification

  Deposition source : - RF ion beam source or magnetron sputter source (selectable) - RF ion beam source: INFO-60G - Magnetron sputter source : up to 6” cathode Combinatorial target quantity : max 3ea (co- sputter process) Moving mask shutter speed : max 11 mm/min Sample size : 2 ~ 6 inch Transfer chamber : auto transfer robot Base pressure : - Process chamber ≤ 1 x 10-7 torr - Transfer chamber ≤ 1 x 10-6 torr Software interfaces : HMI programing base GUI software Combinatorial Process Features - To make binary & ternary phase alloys at a high temp at one time - Rapid investigation to find ideal composition of numerous compounds - Excellent film uniformity on the 6” Wafer - Possible to change deposition modes (combinatorial & co-sputtering) - Atomic layer controlled thin films