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진공장비 - RTA

RTA (Rapid Thermal Annealing)

Detail

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  • RTA system is Rapid Thermal Annealing system, Its temperature can reach up to
    1000 ℃ within short time (~few second) by using halogen lamp as a heating element.
    Its window and sample holder can be used with a quartz for the thermal durability.

    Specification Temp range: 400~1000℃
    Temp control accuracy: < ± 1.0°C
    Temp uniformity:
    - Glass < ± 1.5% @ 100~ATM torr (gas flow condition)
    - Wafer < ± 2% @ 100~ATM torr (gas flow condition)
    Ramp up rate: Max. 40°C/sec
    Susceptor size: 4 ~ 6 inch wafer and 200 X 200 (bare glass)
    Process pressure: vacuum(throttle function) & ATM
    Application Thermal treatment
    Oxidation process.